REACTIVE EVAPORATION OF TiO2 AND SiO2 FILMS FOR MULTILAYER COATINGS

Abstract

The optinzum deposition parameters for Tio2 and SiO2 films for the multilayer coatings are reported. The influence of residual pressure of oxygen in the range of 10 -4-10-5 torr, rate of evaporation between 1 and 22 A sec-1 and different oxides of titanium on the refractive index and transmittance of quarter wave films are studied. The characteristic absorption peaks are at 7.0u for TiO 2 and 9.5 u for Si0 2 . 11 to 21 layers of quarter wave tnultilayer stacks were tested for their durability and stability and found to be good.