Vol 81, No 6 (2001)

(Nov - Dec 2001) Special issue on Microsystem Technology - 2

Table of Contents

Editorial Committee

Editorial Committee
 
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Preface

Preface
Vikram Kumar
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615

Review Articles

SOI sensors and epitaxial MEMS.
Makoto Ishida
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619
Formation of diamond films by pulsed discharge plasma chemical vapor deposition.
Mikio Noda
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627
Ferroelectric films and micro devices.
T C Goel, A K Tripathi
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637
PMMA As an etch mask for silicon micromachining a feasibility study.
Dhananjay Bodas, Sheetal J Patil, V N Krishnamurthy, S A Gangal
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645

Short Communications

Optical and electrical properties of (V2O5)1-x- (MoO3 )x thin films.
K V Madhuri, K Srinivasa Rao, S Uthanna, B S Naidu, O M Hussain
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653
An overview of 3D structuring in microdomain.(MoO3 )x thin films.
Y P Kathuria
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659
Laser probing of micromachined capacitive pressure sensor silicon membrane.(MoO3 )x thin films.
G Bose, Ravi Shanker, Suneet Tuli
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665
Plasma etching processes for the realization of micromechanical structures for MEMS. (MoO3 )x thin films.
A K Paul, A K Dimri, R P Bajpai
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669

IISc Thesis Abstracts

IISc Theses Abstracts
 
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675