L3: Laser, LIGA and lithography in microstructuring

Abstract

Established techniques of laser, LIGA and lithography processes have made the fabrication of three-dimensional structures in micron and submicron order feasible. Presently, most of these technologies employ top-down approach, whereas the futuristic nanotechnology will use the bottom-up approach. These technologies have demonstrated the performance and reliability with high resolution. Combination of these technologies will further enhance the device functionality and increase the device density. This paper highlights some of these features and demonstrates with a few applications.